关键词: 矩形靶, 卷对卷, 真空磁控溅射, 膜厚均匀性, 仿真

Abstract: In this paper，a sputtered theoretical model is proposed on the basis of the roll-to-roll system with a rec-
tangular target，and with the help of the simulation software Matlab，it is used to analyze the film thickness uniformity of the rolled flexible substrate，whose width is 100mm with a bending radius of 100mm and a bending angle of 80°． First，in the stillness of main roller，the situation of the film thickness uniformity error is investigated by adjusting the geometry size of target and the substrate-to-target distance． The results show that the film thickness uniformity error as a whole decreases with the increase of the geometry size of target，and that as the substrate-to-target distance increases，the middle parts of the film thickness uniformity error first increase and then decrease，while both sides of the film thickness uniformity error decrease． Next，in the rolling condition，the distribution of the film thickness uniformity error is discussed by adjusting the substrate-to-target distance and keeping a constant geometry size of target． It is found that the film thickness uniformity error first increase and then decrease as the substrate-to-target distance increases． Simulaiton results also show that the rolling film thickness uniformity error locates between the middle maximum of the stilling film thickness uniformity error distribution curve Max-Min and the average of the reference points on this distribution curve． Through the simulation of the proposed model，the rolling film thickness uniformity error on the basis of the roll-to-roll system with a rectangular target can be predicted quickly and the number of debugging can be reduced significantly．

Key words: rectangular target, roll-to-roll, vacuum magnetron sputtering, film thickness uniformity, simulation