Journal of South China University of Technology (Natural Science Edition) ›› 2016, Vol. 44 ›› Issue (1): 30-36,43.doi: 10.3969/j.issn.1000-565X.2016.01.005

• Electronics, Communication & Automation Technology • Previous Articles     Next Articles

A Unified Channel Potential Model for Asymetrical Dual Gate a-Si: H Thin Film Transistors

QIN Jian YAO Ruo-he   

  1. School of Electronic and Information Engineering,South China University of Technology,Guangzhou 510640,Guangdong,China
  • Received:2015-05-11 Revised:2015-08-28 Online:2016-01-25 Published:2015-12-09
  • Contact: 姚若河( 1961-) ,男,教授,博士生导师,主要从事集成电路系统设计、半导体物理及器件研究. E-mail:phrhyao@scut.edu.cn
  • About author:秦剑( 1981-) ,男,博士生,讲师,主要从事薄膜晶体管TFT 的制备与建模研究. E-mail: gzu_jyuan@163. com
  • Supported by:
    Supported by the National Natural Science Foundation of China( 61274085)

Abstract: On the basis of the Gauss's law,two sets of implicit potential equations describing the changes of surface potential and back one with gate voltage are established for asymmetrical dual gate a-Si: TFT thin film transistors.Then,a unified channel potential model with two independent gates is constructed by solving 1-D Poisson equations.This model can be simplified to a symmetric dual gate model under given conditions.In addition,most of relevant parameters can be physically extracted from real experimental data and only few fitting parameters are involved.On this basis,a novel scheme for the approximation of surface potentials is proposed by means of mathematical transformation and by using the Lambert W function.Numerical results show that the proposed scheme is of better convergence and the approximation of those potentials can be directly used to set the initial values of simulation tools,which effectively improves the computation efficiency of self-consistent solutions to the constructed model.

Key words: asymetrical dual gate thin film transistor, surface potential, a-Si: H, density of states, approximate solution