Journal of South China University of Technology(Natural Science Edition) ›› 2004, Vol. 32 ›› Issue (5): 34-37.doi: 1000-565X(2004)05-0034-04

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Test and Modification of Joule-heated Effect of Metal Interconnector in Integrated Circuit

Zhan Yu-sheng  Zheng Xue-ren   

  1. Dept.of Applied Physics‚South China Univ.of Tech.‚Guangzhou510640‚Guangdong‚China
  • Received:2003-10-29 Online:2004-05-20 Published:2015-09-08
  • Contact: 詹郁生(1974-)‚男‚硕士‚主要从事半导体集成电路系统的研究. E-mail:yszhan@scut.edu.cn
  • About author:詹郁生(1974-)‚男‚硕士‚主要从事半导体集成电路系统的研究.

Abstract: By using the fitting method and the DESTIN testing system‚the relationship between the temperature and the resistance of the metal interconnector in integrated circuit (IC) was studied‚and the Joule-heated effect of the metal in-terconnectors with various materials‚sizes and structures were then investigated.It is revealed that in the accelerating test conditions with high current density and high temperature‚the Joule-heated effect must be taken into consideration‚for the metal temperature auto-increases rather rapidly.By the proposed method‚the error caused by the replacement of real temperature in specimen surface by the circumstance temperature can be settled‚thus obtaining the reliability analysis re-sult with more accuracy.

Key words:  Joule-heated effect, integrated circuit, metal interconnector, electromigration

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