Journal of South China University of Technology (Natural Science Edition) ›› 2015, Vol. 43 ›› Issue (11): 81-86.doi: 10.3969/j.issn.1000-565X.2015.11.012

• Materials Science & Technology • Previous Articles     Next Articles

Thickness Uniformity Control of Sputtered Film Based on Roll-to-Roll System with a Rectangular Target

Huang Yun-xiang1 Wen Wan-yu1 Sun Jia-wei 1 Huai Chuang-feng1 Zeng Hai-feng2 Zhong Fu-hui 2   

  1. 1. Key Laboratory for Surface Functional Structure Manufacturing,South China University of Technology,Guangzhou 510640,Guangdong,China; 2. Yangjiang Henergy Industrial Co.,Ltd.,Centre of Fabrication and Promotion for CIGSSolar Cells,Yangjiang 529533,Guangdong,China
  • Received:2015-04-03 Revised:2015-06-11 Online:2015-11-25 Published:2015-10-01
  • Contact: 黄云翔( 1987-) ,男,博士生,主要从事薄膜太阳电池、溅射镀膜、电化学沉积等的研究 E-mail:282092874@qq.com
  • About author:黄云翔( 1987-) ,男,博士生,主要从事薄膜太阳电池、溅射镀膜、电化学沉积等的研究
  • Supported by:
    Supported by the Strategic Emerging Industry Core Technology Research Project of Guangdong Province
    (2012A032300009)

Abstract: In this paper,a sputtered theoretical model is proposed on the basis of the roll-to-roll system with a rec-
tangular target,and with the help of the simulation software Matlab,it is used to analyze the film thickness uniformity of the rolled flexible substrate,whose width is 100mm with a bending radius of 100mm and a bending angle of 80°. First,in the stillness of main roller,the situation of the film thickness uniformity error is investigated by adjusting the geometry size of target and the substrate-to-target distance. The results show that the film thickness uniformity error as a whole decreases with the increase of the geometry size of target,and that as the substrate-to-target distance increases,the middle parts of the film thickness uniformity error first increase and then decrease,while both sides of the film thickness uniformity error decrease. Next,in the rolling condition,the distribution of the film thickness uniformity error is discussed by adjusting the substrate-to-target distance and keeping a constant geometry size of target. It is found that the film thickness uniformity error first increase and then decrease as the substrate-to-target distance increases. Simulaiton results also show that the rolling film thickness uniformity error locates between the middle maximum of the stilling film thickness uniformity error distribution curve Max-Min and the average of the reference points on this distribution curve. Through the simulation of the proposed model,the rolling film thickness uniformity error on the basis of the roll-to-roll system with a rectangular target can be predicted quickly and the number of debugging can be reduced significantly.

Key words: rectangular target, roll-to-roll, vacuum magnetron sputtering, film thickness uniformity, simulation

CLC Number: