Journal of South China University of Technology (Natural Science Edition) ›› 2009, Vol. 37 ›› Issue (1): 15-18,23.

• Electronics, Communication & Automation Technology • Previous Articles     Next Articles

Numerical Simulation of Unsaturated Output Current of Amorphous-Silicon Thin-Film Transistors

Liu Yuan  Yao Ruo-he  Li Bin   

  1. School of Electronic and Information Engineering, South China University of Technology, Guangzhou 510640, Guangdong, China
  • Received:2007-11-09 Revised:2008-03-30 Online:2009-01-25 Published:2009-01-25
  • Contact: 姚若河(1961-),男,教授,博士生导师,主要从事集成电路设计、计算微电子学和新型光电器件等研究.E-mail:phrhyao@scut.edu.cn E-mail:liu.yuanl@mail.scut.edu.cn
  • About author:刘远(1984-),男,博士生,主要从事非晶硅薄膜晶体管的建模与仿真研究.
  • Supported by:

    国家自然科学基金资助项目(60776020);Cadence公司基金资助项目

Abstract:

In order to overcome the unsaturated output current of hydrogenated amorphous-silicon thin-film transistors ( a-Si : H TFTs), the output characteristics of a-Si : H TFTs are numerically simulated by using the semiconductor device simulation software, and the generation mechanism of the unsaturated output current is discussed. Simulated results show that, in long-channel semiconductor devices, the conduction of bulk current changes into a space charge-limited mode due to the increase of drain-source voltage, which is the main reason for the unsaturated output current, and that, in short-channel semiconductor devices, the drain-induced barrier lowering effect should be meanwhile considered.

Key words: amorphous silicon, thin-film transistor, unsaturated output current, numerical simulation, space charge-limited conduction, drain-induced barrier lowering