Electronics, Communication & Automation Technology

Investigation into Voltage-Current Characteristics of ZnO/p-Si Heterojunction Based on Diffusing Models

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  • South China university of technology, electronic and information institute, guangdong guangzhou 510640
熊超(1982一),男,博士生,主要从事氧化锌/硅异质结太阳能电池的特性研究

Received date: 2010-04-07

  Revised date: 2010-06-04

  Online published: 2011-01-02

Supported by

国家自然科学基金资助项目(60776020);广东省科技攻关项目(A1100501)

Abstract

 In order to reveal the conduction mechanism of ZnO/p-Si heterojunction,the voltage-current characteristics of the heterojunction in ideal conditions are investigated based on the p-n junction diffusing model and the Anderson diffusing model,and the effects of doping concentration,working temperature and band compensation on the voltage-current characteristics are analyzed.The results indicate that(1) when the forward bias exceeds the built-in potential,the state of most carriers at the two sides of the interface changes from exhaustion into accumulation,thus forming reverse barrier to obstruct the movement of positive electric current in ZnO/p-Si heterojunction;(2) when the applied voltage equals the built-in potential,an inflection point occurs in the voltage-current curve;(3) when the applied voltage exceeds the inflection point voltage,the increasing speed of the current density with the voltage becomes slow;(4) the reverse saturation current density decreases with the increase in doping concentration of p-Si and with the decrease in working temperature,but it is insensitive both to the doping concentration of ZnO and to the conduction band offset;and(5) the applied voltage corresponding to the inflection point is positively related to the doping concentrations of p-Si and ZnO but negatively related to the working temperature and the conduction band offset.

Cite this article

Xiong Chao Yao Ruo-he Geng Kui-wei . Investigation into Voltage-Current Characteristics of ZnO/p-Si Heterojunction Based on Diffusing Models[J]. Journal of South China University of Technology(Natural Science), 2011 , 39(2) : 1 -6 . DOI: 10.3969/j.issn.1000-565X.2011.02.001

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