Electronics, Communication & Automation Technology

Research on Thermal Hysteresis of Silicon-Based Semiconductor

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  • State Key Laboratory of Advanced Technology for Materials Synthesis and Processing,Wuhan University of Technology,Wuhan 430070,Hubei,China
孙志刚( 1969-) ,男,教授,主要从事非磁性半导体电输运性能研究.

Received date: 2015-11-20

  Revised date: 2016-07-13

  Online published: 2016-12-01

Supported by

Supported by the National Natural Science Foundation of China( 11574243, 11174231)

Abstract

In this paper,the electrical transport properties ( V-I characteristics) of Ag /SiO2 /p-Si ∶ B /SiO2 /Ag device at different temperatures are investigated by means of four-wire method,finding that an obvious thermal hysteresis phenomenon occurs in V-I curves at low temperatures.In order to eliminate the experimental errors caused by the thermal hysteresis,two methods of prolonging the interval between two consecutive measurements and improving the heat conduction ability of system are proposed,and the first method is used to remove the effects of the thermal hysteresis on the electrical transport properties of the device.The results show that when the electrical properties and magnetoresistance effects of semiconductor-based materials are investigated,the thermal hysteresis phenomenon should be treated carefully,otherwise it may lead to erroneous results.

Cite this article

SUN Zhi-gang HE Xiong XIE Qing-xing LI Yue-chou PANG Yu-yu . Research on Thermal Hysteresis of Silicon-Based Semiconductor[J]. Journal of South China University of Technology(Natural Science), 2017 , 45(1) : 48 -52 . DOI: 10.3969/j.issn.1000-565X.2017.01.007

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