用IR及XPS研究Photo-CVD SiO_2薄膜特性
刘玉荣, 李观启, 黄美浅
Properties of Photochemical Vapor Deposition Silicon Dioxide Thin-film Studied by IR and XPS
Liu Yu-rong, Li Guan-qi
华南理工大学学报(自然科学版) . 2003, (7): 61 -64 .